Surface nanopatterning by polymer self-assembly: From applied research to industrial applications

Raphaël Pugin, Nicolas Blondiaux, Ana Maria Popa, Philippe Niedermann, Martha Liley, Marta Giazzon, Nadege Matthey, Jeffrey Alan Hubbell, H. Heinzelmann

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Complementary methods have been developed for surface nanostructuring using molecular self-assembly, reactive ion etching and replication techniques. First, controlled surface nanostructures with tunable lateral dimensions from tens of nanometer to tens of micrometers have been produced by polymer self-assembly, over large area and at low cost. The resulting nanostructures could find applications as antireflective layer or as security features for traceability and anti-counterfeiting applications. Second, the as-deposited polymeric surface structures could be used as micro- and nano-patterned etch masks for the transfer of the structure into the underlying material through reactive ion etching. This process leads to more durable structures with tunable aspect ratios from 1:1 to 10:1 in hard materials such as silicon, silicon nitride or quartz. Potential applications of these techniques include the development of superhydrophobic and self-cleaning surfaces for MEMS, as well as the fabrication of nanoporous membranes for ultrafiltration. Polymeric nanopatterns can also be used as mastering tools for replication. Casting, embossing and moulding of self-assembled structures in plastics have all been shown to be possible.

Original languageEnglish
Pages (from-to)229-233
Number of pages5
JournalJournal of Photopolymer Science and Technology
Volume22
Issue number2
DOIs
StatePublished - Oct 26 2009
Externally publishedYes

Fingerprint

Self assembly
Industrial applications
Polymers
Reactive ion etching
Nanostructures
Surface cleaning
Quartz
Silicon
Ultrafiltration
Silicon nitride
Surface structure
Molding
MEMS
Aspect ratio
Masks
Casting
Plastics
Membranes
Fabrication
Costs

Keywords

  • Membranes
  • Nanofabrication
  • Nanoreplication
  • Nanostructures
  • Polymer self-assembly
  • Surface nanopatterning

ASJC Scopus subject areas

  • Materials Chemistry
  • Polymers and Plastics
  • Organic Chemistry

Cite this

Pugin, R., Blondiaux, N., Popa, A. M., Niedermann, P., Liley, M., Giazzon, M., ... Heinzelmann, H. (2009). Surface nanopatterning by polymer self-assembly: From applied research to industrial applications. Journal of Photopolymer Science and Technology, 22(2), 229-233. https://doi.org/10.2494/photopolymer.22.229

Surface nanopatterning by polymer self-assembly : From applied research to industrial applications. / Pugin, Raphaël; Blondiaux, Nicolas; Popa, Ana Maria; Niedermann, Philippe; Liley, Martha; Giazzon, Marta; Matthey, Nadege; Hubbell, Jeffrey Alan; Heinzelmann, H.

In: Journal of Photopolymer Science and Technology, Vol. 22, No. 2, 26.10.2009, p. 229-233.

Research output: Contribution to journalArticle

Pugin, R, Blondiaux, N, Popa, AM, Niedermann, P, Liley, M, Giazzon, M, Matthey, N, Hubbell, JA & Heinzelmann, H 2009, 'Surface nanopatterning by polymer self-assembly: From applied research to industrial applications', Journal of Photopolymer Science and Technology, vol. 22, no. 2, pp. 229-233. https://doi.org/10.2494/photopolymer.22.229
Pugin, Raphaël ; Blondiaux, Nicolas ; Popa, Ana Maria ; Niedermann, Philippe ; Liley, Martha ; Giazzon, Marta ; Matthey, Nadege ; Hubbell, Jeffrey Alan ; Heinzelmann, H. / Surface nanopatterning by polymer self-assembly : From applied research to industrial applications. In: Journal of Photopolymer Science and Technology. 2009 ; Vol. 22, No. 2. pp. 229-233.
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