Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects

Guomin Jiang; Sarfaraz Baig; Michael R. Wang

doi:10.1117/12.908243

Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects

Guomin Jiang, Sarfaraz Baig, Michael R. Wang

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

Abstract

Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.

Original language	English (US)
Title of host publication	Optoelectronic Interconnects XII
DOIs	https://doi.org/10.1117/12.908243
State	Published - Mar 26 2012
Event	Optoelectronic Interconnects XII - San Francisco, CA, United States Duration: Jan 23 2012 → Jan 25 2012

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8267
ISSN (Print)	0277-786X

Other

Other	Optoelectronic Interconnects XII
Country	United States
City	San Francisco, CA
Period	1/23/12 → 1/25/12

Keywords

Microfluidic
Optical Interconnection
Polymer Waveguide
Soft Lithography

ASJC Scopus subject areas

Applied Mathematics
Computer Science Applications
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1117/12.908243

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Cite this

Jiang, G., Baig, S., & Wang, M. R. (2012). Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects. In Optoelectronic Interconnects XII [82670R] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8267). https://doi.org/10.1117/12.908243

Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects. / Jiang, Guomin; Baig, Sarfaraz; Wang, Michael R.

Optoelectronic Interconnects XII. 2012. 82670R (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8267).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Jiang, G, Baig, S & Wang, MR 2012, Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects. in Optoelectronic Interconnects XII., 82670R, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8267, Optoelectronic Interconnects XII, San Francisco, CA, United States, 1/23/12. https://doi.org/10.1117/12.908243

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abstract = "Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.",

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