Abstract
Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 8267 |
| DOIs | |
| State | Published - Mar 26 2012 |
| Event | Optoelectronic Interconnects XII - San Francisco, CA, United States Duration: Jan 23 2012 → Jan 25 2012 |
Other
| Other | Optoelectronic Interconnects XII |
|---|---|
| Country | United States |
| City | San Francisco, CA |
| Period | 1/23/12 → 1/25/12 |
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Keywords
- Microfluidic
- Optical Interconnection
- Polymer Waveguide
- Soft Lithography
ASJC Scopus subject areas
- Applied Mathematics
- Computer Science Applications
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
Cite this
Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects. / Jiang, Guomin; Baig, Sarfaraz; Wang, Michael Renxun.
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8267 2012. 82670R.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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TY - GEN
T1 - Soft lithography fabricated polymer waveguides with 45° inclined mirrors for Card-to-backplane optical interconnects
AU - Jiang, Guomin
AU - Baig, Sarfaraz
AU - Wang, Michael Renxun
PY - 2012/3/26
Y1 - 2012/3/26
N2 - Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.
AB - Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.
KW - Microfluidic
KW - Optical Interconnection
KW - Polymer Waveguide
KW - Soft Lithography
UR - http://www.scopus.com/inward/record.url?scp=84863348585&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84863348585&partnerID=8YFLogxK
U2 - 10.1117/12.908243
DO - 10.1117/12.908243
M3 - Conference contribution
AN - SCOPUS:84863348585
SN - 9780819489104
VL - 8267
BT - Proceedings of SPIE - The International Society for Optical Engineering
ER -