Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO 2/indium tin oxide-coated glass substrates

Jost W. Lussi, Clarence Tang, Pierre Andre Kuenzi, Urs Staufer, Gabor Csucs, Janos Vörös, Gaudenz Danuser, Jeffrey A. Hubbell, Marcus Textor

Research output: Contribution to journalReview article

39 Scopus citations

Abstract

The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly patterning (SMAP) on transparent glass substrates. In this paper we demonstrate that the use of thin films of conductive indium tin oxide resolves the issue of surface charging during e-beam writing while being compatible with the standard SMAP protocol for surface modification.

Original languageEnglish (US)
Pages (from-to)1781-1786
Number of pages6
JournalNanotechnology
Volume16
Issue number9
DOIs
StatePublished - Sep 1 2005

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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