Robust microstructures using UV photopatternable semiconductor nanocrystals

Jin Kim Won, Jin Kim Sung, Kwang Sup Lee, Marek Samoc, Alexander N. Cartwright, Paras N. Prasad

Research output: Contribution to journalArticle

50 Scopus citations

Abstract

We report an approach to produce predefined patterns of quantum dots and multipod nanocrystals using optical lithography for direct writing of films for optoelectronic and electronic devices. To obtain photopatternability, the nanostructures (for example, CdSe, CdTe, and PbSe nanocrystals) were functionalized by incorporation of the functional ligand t-butoxycarbonyl (t-BOC) which has an acid-labile moiety. This change in the surface chemistry results in the ability to photopattern the semiconductor nanocrystals where desired for a number of optoelectronic device geometries. We demonstrate that the ultimate resolution (line width and spacing) of this technique is below 5 μm (the limit of our optical apparatus used for writing).

Original languageEnglish (US)
Pages (from-to)3262-3265
Number of pages4
JournalNano Letters
Volume8
Issue number10
DOIs
StatePublished - Oct 1 2008
Externally publishedYes

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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    Won, J. K., Sung, J. K., Lee, K. S., Samoc, M., Cartwright, A. N., & Prasad, P. N. (2008). Robust microstructures using UV photopatternable semiconductor nanocrystals. Nano Letters, 8(10), 3262-3265. https://doi.org/10.1021/nl8016219