Phototocatalytic lithography of poly(propylene sulfide) block copolymers

toward high-throughput nanolithography for biomolecular arraying applications

Jane P. Bearinger, Gary Stone, Amy L. Hiddessen, Lawrence C. Dugan, Ligang Wu, Philip Hailey, James W. Conway, Tobias Kuenzler, Lydia Feller, Simona Cerritelli, Jeffrey A. Hubbell

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Photocatalytic lithography (PCL) is an inexpensive, fast, and robust method of oxidizing surface chemical moieties to produce patterned substrates. This technique has utility in basic biological research as well as various biochip applications. We report on porphyrin-based PCL for patterning poly(propylene sulfide) block copolymer films on gold substrates on the micrometer and submicrometer scales. We confirm chemical patterning with imaging ToF-SIMS and low-voltage SEM. Biomolecular patterning on micrometer and submicrometer scales is demonstrated with proteins, protein-linked beads. and fluorescently labeled proteins.

Original languageEnglish
Pages (from-to)1238-1244
Number of pages7
JournalLangmuir
Volume25
Issue number2
DOIs
StatePublished - Jan 20 2009
Externally publishedYes

Fingerprint

Nanolithography
block copolymers
polypropylene
Lithography
Block copolymers
sulfides
Polypropylenes
lithography
Throughput
proteins
Proteins
micrometers
Biochips
Porphyrins
Substrates
Secondary ion mass spectrometry
porphyrins
Gold
beads
low voltage

ASJC Scopus subject areas

  • Electrochemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Science(all)
  • Spectroscopy

Cite this

Bearinger, J. P., Stone, G., Hiddessen, A. L., Dugan, L. C., Wu, L., Hailey, P., ... Hubbell, J. A. (2009). Phototocatalytic lithography of poly(propylene sulfide) block copolymers: toward high-throughput nanolithography for biomolecular arraying applications. Langmuir, 25(2), 1238-1244. https://doi.org/10.1021/la802727s

Phototocatalytic lithography of poly(propylene sulfide) block copolymers : toward high-throughput nanolithography for biomolecular arraying applications. / Bearinger, Jane P.; Stone, Gary; Hiddessen, Amy L.; Dugan, Lawrence C.; Wu, Ligang; Hailey, Philip; Conway, James W.; Kuenzler, Tobias; Feller, Lydia; Cerritelli, Simona; Hubbell, Jeffrey A.

In: Langmuir, Vol. 25, No. 2, 20.01.2009, p. 1238-1244.

Research output: Contribution to journalArticle

Bearinger, JP, Stone, G, Hiddessen, AL, Dugan, LC, Wu, L, Hailey, P, Conway, JW, Kuenzler, T, Feller, L, Cerritelli, S & Hubbell, JA 2009, 'Phototocatalytic lithography of poly(propylene sulfide) block copolymers: toward high-throughput nanolithography for biomolecular arraying applications', Langmuir, vol. 25, no. 2, pp. 1238-1244. https://doi.org/10.1021/la802727s
Bearinger, Jane P. ; Stone, Gary ; Hiddessen, Amy L. ; Dugan, Lawrence C. ; Wu, Ligang ; Hailey, Philip ; Conway, James W. ; Kuenzler, Tobias ; Feller, Lydia ; Cerritelli, Simona ; Hubbell, Jeffrey A. / Phototocatalytic lithography of poly(propylene sulfide) block copolymers : toward high-throughput nanolithography for biomolecular arraying applications. In: Langmuir. 2009 ; Vol. 25, No. 2. pp. 1238-1244.
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