Multiple-wavelength ellipsometry in thin uniaxial nonabsorbing films

Adel F. Antippa, Roger Leblanc, Daniel Ducharme

Research output: Contribution to journalArticle

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Abstract

We develop and solve the equations of multiple-wavelength ellipsometry for thin uniaxial nonabsorbing films. We show that the values of the thickness and the real refractive indices (parallel and perpendicular to the optical axis) of the thin film can be obtained by three measurements, at three different wavelengths, of the phase difference (between the filmed and bare substrate phase changes caused by reflection), provided that the refractive indices of both the incident medium and the substrate are significantly dispersive. We also show, in the case of a dispersive thin film, how to determine the indices of refraction in terms of wavelength up to any desired accuracy by making the appropriate number of measurements of the phase difference at different wavelengths.

Original languageEnglish (US)
Pages (from-to)1794-1802
Number of pages9
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume3
Issue number11
DOIs
StatePublished - Jan 1 1986
Externally publishedYes

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ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Computer Vision and Pattern Recognition
  • Electronic, Optical and Magnetic Materials

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