Abstract
A new technique of laser-assisted single-step chemical etching for diffractive microlens fabrication upon high-energy-beam sensitive glass is reported. Laser direct writing with calibrated writing parameters results in gray-level mask patterns upon the ion-exchanged layer of the glass. The transmittance-dependent chemical etching upon the glass is then effectively utilized to yield suitable surface relief structures for multiple-phase-level diffractive optical elements. The one-step nonphotolithographic fabrication technique has been successfully applied for the realization of an eight-phase-level diffractive microlens.
| Original language | English |
|---|---|
| Pages (from-to) | 876-878 |
| Number of pages | 3 |
| Journal | Optics Letters |
| Volume | 23 |
| Issue number | 11 |
| State | Published - Jun 1 1998 |
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ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
Cite this
Multilevel diffractive microlens fabrication by one-step laser-assisted chemical etching upon high-energy-beam sensitive glass. / Wang, Michael Renxun; Su, Heng.
In: Optics Letters, Vol. 23, No. 11, 01.06.1998, p. 876-878.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Multilevel diffractive microlens fabrication by one-step laser-assisted chemical etching upon high-energy-beam sensitive glass
AU - Wang, Michael Renxun
AU - Su, Heng
PY - 1998/6/1
Y1 - 1998/6/1
N2 - A new technique of laser-assisted single-step chemical etching for diffractive microlens fabrication upon high-energy-beam sensitive glass is reported. Laser direct writing with calibrated writing parameters results in gray-level mask patterns upon the ion-exchanged layer of the glass. The transmittance-dependent chemical etching upon the glass is then effectively utilized to yield suitable surface relief structures for multiple-phase-level diffractive optical elements. The one-step nonphotolithographic fabrication technique has been successfully applied for the realization of an eight-phase-level diffractive microlens.
AB - A new technique of laser-assisted single-step chemical etching for diffractive microlens fabrication upon high-energy-beam sensitive glass is reported. Laser direct writing with calibrated writing parameters results in gray-level mask patterns upon the ion-exchanged layer of the glass. The transmittance-dependent chemical etching upon the glass is then effectively utilized to yield suitable surface relief structures for multiple-phase-level diffractive optical elements. The one-step nonphotolithographic fabrication technique has been successfully applied for the realization of an eight-phase-level diffractive microlens.
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UR - http://www.scopus.com/inward/citedby.url?scp=0032095581&partnerID=8YFLogxK
M3 - Article
C2 - 18087371
AN - SCOPUS:0032095581
VL - 23
SP - 876
EP - 878
JO - Optics Letters
JF - Optics Letters
SN - 0146-9592
IS - 11
ER -