Abstract
A new technique of laser-assisted single-step chemical etching for diffractive microlens fabrication upon high-energy-beam sensitive glass is reported. Laser direct writing with calibrated writing parameters results in gray-level mask patterns upon the ion-exchanged layer of the glass. The transmittance-dependent chemical etching upon the glass is then effectively utilized to yield suitable surface relief structures for multiple-phase-level diffractive optical elements. The one-step nonphotolithographic fabrication technique has been successfully applied for the realization of an eight-phase-level diffractive microlens.
Original language | English (US) |
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Pages (from-to) | 876-878 |
Number of pages | 3 |
Journal | Optics Letters |
Volume | 23 |
Issue number | 11 |
DOIs | |
State | Published - Jun 1 1998 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics