Abstract
The perpendicular fields emanating from an ultra small perpendicular single pole head have been quantified using a new MFM field mapping technique. This technique utilizes two MFM tips with different field sensitivities which have been focused ion beam etched to identical geometries. This technique has been used to quantify the perpendicular fields around a 100×200 nm pole, also fabricated with focused ion beam etching.
Original language | English (US) |
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Pages (from-to) | 2030-2032 |
Number of pages | 3 |
Journal | IEEE Transactions on Magnetics |
Volume | 34 |
Issue number | 4 pt 1 |
DOIs | |
State | Published - Jul 1998 |
Externally published | Yes |
Event | Proceedings of the 1998 7th Joint Magnetism and Magnetic Materials - International Magnetics Conference. Part 1 (of 2) - San Francisco, CA, USA Duration: Jan 6 1998 → Jan 9 1998 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering