Matrix-assisted dip-pen nanolithography and polymer pen lithography

Ling Huang, Adam Braunschweig, Wooyoung Shim, Lidong Qin, Jong Kuk Lim, Sarah J. Hurst, Fengwei Huo, Can Xue, Jae Won Jang, Chad A. Mirkin

Research output: Contribution to journalArticle

60 Citations (Scopus)

Abstract

PEG (MW 2000 g mol-1) and C60 were purchased from Sigma Aldrich (USA). AuNPs (13-nm)[29] and 5-nm Fe3O4 MNPs[30] were prepared in our labs following literature protocols. Si/SiOx (100) wafers with a 500-nm oxide coating layer and GaAs (100) wafers were purchased from Nova Materials Inc. (USA). Au substrates were prepared by thermal evaporation (BOC Edwards Auto306, UK) of an Au thin film (30 nm) on a Si/SiOx substrate cleaned by sonication in ethanol and pre-coated with a Ti adhesion layer (7 nm). AFM topographical and magnetic force microscopy (MFM) images were recorded on a Veeco Bioscope equipped with a Nanoscope IIIA controller and optical microscopy images were taken using a Zeiss Axiovert 200M (Carl Zeiss, Inc., Germany). DPN and PPL experiments were performed with a NScriptor nanolithography platform (NanoInk, Inc., USA) equipped with an environmental chamber with active humidity control driven by commercially available InkCAD DPN software (NanoInk, Inc., USA). High-resolution magnetic probes for MFM (MESP-HR) were purchased from Veeco Probes (USA) and Pointprobe Plus Si SPM sensors (Nanosensors, Inc., USA) were used for topographical and non-contact imaging. DPN experiments: In a typical experiment, PEG (2000 g mol-1, 5mgmL-1) was dissolved in a solvent (10 mL). NM solution (50 μL of 10 mg mL-1) was added to the PEG solution and sonicated for 1 min. Twelve-pen M-type tip arrays (NanoInk, Inc., USA) were dipped in the solution and dried under a flowing N2 stream. DPN experiments were performed in an environmental chamber with active humidity control at a relative humidity of 90% at a temperature of 25-29 8°C. The patterns were generated using InkCAD software (NanoInk, Inc., USA) that could control dwell time and position of the tip arrays on the surface. PPL experiments: Polymer-pen tip arrays with 80-mm spacing between tips were prepared as previously reported[12]. In a typical experiment, PEG (2000 g mol-1, 5 mg mL-1) was dissolved in a solvent (10 μL). NM solution (50μL at 10mg mL-1) was added to the PEG solution and sonicated for 1 min. The ink solution was added to the PDMS tip arrays by spin-coating (1 mL, 2000 rpm, 3min). PPL experiments were carried out on an NScriptor workstation as described previously[12] using InkCAD software (NanoInk, Inc., USA) with feedback turned off and a relative humidity of x wafer with a 500-nm thermal oxide layer. The inner nanoelectrodes were patterned by electron-beam lithography followed by thermal evaporation and resist liftoff, resulting in electrodes with a gap of 500 nm (Figure S4). The C60-PEG composite ink was deposited by MA-DPN at a scanning rate of 0.01 μ s-1.

Original languageEnglish (US)
Pages (from-to)1077-1081
Number of pages5
JournalSmall
Volume6
Issue number10
DOIs
StatePublished - May 21 2010
Externally publishedYes

Fingerprint

Nanolithography
Lithography
Polymers
NAD
Polyethylene glycols
Humidity
Ink
Humidity control
Software
Magnetic force microscopy
Environmental chambers
Hot Temperature
Atomic Force Microscopy
Experiments
Thermal evaporation
Oxides
Atmospheric humidity
Sonication
Nanosensors
Electron beam lithography

Keywords

  • Dip-pen nanolithography
  • Nanomaterials poly(ethylene glycol)
  • Polymer-pen lithography

ASJC Scopus subject areas

  • Biomaterials
  • Engineering (miscellaneous)
  • Biotechnology
  • Medicine(all)

Cite this

Huang, L., Braunschweig, A., Shim, W., Qin, L., Lim, J. K., Hurst, S. J., ... Mirkin, C. A. (2010). Matrix-assisted dip-pen nanolithography and polymer pen lithography. Small, 6(10), 1077-1081. https://doi.org/10.1002/smll.200901198

Matrix-assisted dip-pen nanolithography and polymer pen lithography. / Huang, Ling; Braunschweig, Adam; Shim, Wooyoung; Qin, Lidong; Lim, Jong Kuk; Hurst, Sarah J.; Huo, Fengwei; Xue, Can; Jang, Jae Won; Mirkin, Chad A.

In: Small, Vol. 6, No. 10, 21.05.2010, p. 1077-1081.

Research output: Contribution to journalArticle

Huang, L, Braunschweig, A, Shim, W, Qin, L, Lim, JK, Hurst, SJ, Huo, F, Xue, C, Jang, JW & Mirkin, CA 2010, 'Matrix-assisted dip-pen nanolithography and polymer pen lithography', Small, vol. 6, no. 10, pp. 1077-1081. https://doi.org/10.1002/smll.200901198
Huang L, Braunschweig A, Shim W, Qin L, Lim JK, Hurst SJ et al. Matrix-assisted dip-pen nanolithography and polymer pen lithography. Small. 2010 May 21;6(10):1077-1081. https://doi.org/10.1002/smll.200901198
Huang, Ling ; Braunschweig, Adam ; Shim, Wooyoung ; Qin, Lidong ; Lim, Jong Kuk ; Hurst, Sarah J. ; Huo, Fengwei ; Xue, Can ; Jang, Jae Won ; Mirkin, Chad A. / Matrix-assisted dip-pen nanolithography and polymer pen lithography. In: Small. 2010 ; Vol. 6, No. 10. pp. 1077-1081.
@article{c5b076844eb14331aba7631fde695a32,
title = "Matrix-assisted dip-pen nanolithography and polymer pen lithography",
abstract = "PEG (MW 2000 g mol-1) and C60 were purchased from Sigma Aldrich (USA). AuNPs (13-nm)[29] and 5-nm Fe3O4 MNPs[30] were prepared in our labs following literature protocols. Si/SiOx (100) wafers with a 500-nm oxide coating layer and GaAs (100) wafers were purchased from Nova Materials Inc. (USA). Au substrates were prepared by thermal evaporation (BOC Edwards Auto306, UK) of an Au thin film (30 nm) on a Si/SiOx substrate cleaned by sonication in ethanol and pre-coated with a Ti adhesion layer (7 nm). AFM topographical and magnetic force microscopy (MFM) images were recorded on a Veeco Bioscope equipped with a Nanoscope IIIA controller and optical microscopy images were taken using a Zeiss Axiovert 200M (Carl Zeiss, Inc., Germany). DPN and PPL experiments were performed with a NScriptor nanolithography platform (NanoInk, Inc., USA) equipped with an environmental chamber with active humidity control driven by commercially available InkCAD DPN software (NanoInk, Inc., USA). High-resolution magnetic probes for MFM (MESP-HR) were purchased from Veeco Probes (USA) and Pointprobe Plus Si SPM sensors (Nanosensors, Inc., USA) were used for topographical and non-contact imaging. DPN experiments: In a typical experiment, PEG (2000 g mol-1, 5mgmL-1) was dissolved in a solvent (10 mL). NM solution (50 μL of 10 mg mL-1) was added to the PEG solution and sonicated for 1 min. Twelve-pen M-type tip arrays (NanoInk, Inc., USA) were dipped in the solution and dried under a flowing N2 stream. DPN experiments were performed in an environmental chamber with active humidity control at a relative humidity of 90{\%} at a temperature of 25-29 8°C. The patterns were generated using InkCAD software (NanoInk, Inc., USA) that could control dwell time and position of the tip arrays on the surface. PPL experiments: Polymer-pen tip arrays with 80-mm spacing between tips were prepared as previously reported[12]. In a typical experiment, PEG (2000 g mol-1, 5 mg mL-1) was dissolved in a solvent (10 μL). NM solution (50μL at 10mg mL-1) was added to the PEG solution and sonicated for 1 min. The ink solution was added to the PDMS tip arrays by spin-coating (1 mL, 2000 rpm, 3min). PPL experiments were carried out on an NScriptor workstation as described previously[12] using InkCAD software (NanoInk, Inc., USA) with feedback turned off and a relative humidity of x wafer with a 500-nm thermal oxide layer. The inner nanoelectrodes were patterned by electron-beam lithography followed by thermal evaporation and resist liftoff, resulting in electrodes with a gap of 500 nm (Figure S4). The C60-PEG composite ink was deposited by MA-DPN at a scanning rate of 0.01 μ s-1.",
keywords = "Dip-pen nanolithography, Nanomaterials poly(ethylene glycol), Polymer-pen lithography",
author = "Ling Huang and Adam Braunschweig and Wooyoung Shim and Lidong Qin and Lim, {Jong Kuk} and Hurst, {Sarah J.} and Fengwei Huo and Can Xue and Jang, {Jae Won} and Mirkin, {Chad A.}",
year = "2010",
month = "5",
day = "21",
doi = "10.1002/smll.200901198",
language = "English (US)",
volume = "6",
pages = "1077--1081",
journal = "Small",
issn = "1613-6810",
publisher = "Wiley-VCH Verlag",
number = "10",

}

TY - JOUR

T1 - Matrix-assisted dip-pen nanolithography and polymer pen lithography

AU - Huang, Ling

AU - Braunschweig, Adam

AU - Shim, Wooyoung

AU - Qin, Lidong

AU - Lim, Jong Kuk

AU - Hurst, Sarah J.

AU - Huo, Fengwei

AU - Xue, Can

AU - Jang, Jae Won

AU - Mirkin, Chad A.

PY - 2010/5/21

Y1 - 2010/5/21

N2 - PEG (MW 2000 g mol-1) and C60 were purchased from Sigma Aldrich (USA). AuNPs (13-nm)[29] and 5-nm Fe3O4 MNPs[30] were prepared in our labs following literature protocols. Si/SiOx (100) wafers with a 500-nm oxide coating layer and GaAs (100) wafers were purchased from Nova Materials Inc. (USA). Au substrates were prepared by thermal evaporation (BOC Edwards Auto306, UK) of an Au thin film (30 nm) on a Si/SiOx substrate cleaned by sonication in ethanol and pre-coated with a Ti adhesion layer (7 nm). AFM topographical and magnetic force microscopy (MFM) images were recorded on a Veeco Bioscope equipped with a Nanoscope IIIA controller and optical microscopy images were taken using a Zeiss Axiovert 200M (Carl Zeiss, Inc., Germany). DPN and PPL experiments were performed with a NScriptor nanolithography platform (NanoInk, Inc., USA) equipped with an environmental chamber with active humidity control driven by commercially available InkCAD DPN software (NanoInk, Inc., USA). High-resolution magnetic probes for MFM (MESP-HR) were purchased from Veeco Probes (USA) and Pointprobe Plus Si SPM sensors (Nanosensors, Inc., USA) were used for topographical and non-contact imaging. DPN experiments: In a typical experiment, PEG (2000 g mol-1, 5mgmL-1) was dissolved in a solvent (10 mL). NM solution (50 μL of 10 mg mL-1) was added to the PEG solution and sonicated for 1 min. Twelve-pen M-type tip arrays (NanoInk, Inc., USA) were dipped in the solution and dried under a flowing N2 stream. DPN experiments were performed in an environmental chamber with active humidity control at a relative humidity of 90% at a temperature of 25-29 8°C. The patterns were generated using InkCAD software (NanoInk, Inc., USA) that could control dwell time and position of the tip arrays on the surface. PPL experiments: Polymer-pen tip arrays with 80-mm spacing between tips were prepared as previously reported[12]. In a typical experiment, PEG (2000 g mol-1, 5 mg mL-1) was dissolved in a solvent (10 μL). NM solution (50μL at 10mg mL-1) was added to the PEG solution and sonicated for 1 min. The ink solution was added to the PDMS tip arrays by spin-coating (1 mL, 2000 rpm, 3min). PPL experiments were carried out on an NScriptor workstation as described previously[12] using InkCAD software (NanoInk, Inc., USA) with feedback turned off and a relative humidity of x wafer with a 500-nm thermal oxide layer. The inner nanoelectrodes were patterned by electron-beam lithography followed by thermal evaporation and resist liftoff, resulting in electrodes with a gap of 500 nm (Figure S4). The C60-PEG composite ink was deposited by MA-DPN at a scanning rate of 0.01 μ s-1.

AB - PEG (MW 2000 g mol-1) and C60 were purchased from Sigma Aldrich (USA). AuNPs (13-nm)[29] and 5-nm Fe3O4 MNPs[30] were prepared in our labs following literature protocols. Si/SiOx (100) wafers with a 500-nm oxide coating layer and GaAs (100) wafers were purchased from Nova Materials Inc. (USA). Au substrates were prepared by thermal evaporation (BOC Edwards Auto306, UK) of an Au thin film (30 nm) on a Si/SiOx substrate cleaned by sonication in ethanol and pre-coated with a Ti adhesion layer (7 nm). AFM topographical and magnetic force microscopy (MFM) images were recorded on a Veeco Bioscope equipped with a Nanoscope IIIA controller and optical microscopy images were taken using a Zeiss Axiovert 200M (Carl Zeiss, Inc., Germany). DPN and PPL experiments were performed with a NScriptor nanolithography platform (NanoInk, Inc., USA) equipped with an environmental chamber with active humidity control driven by commercially available InkCAD DPN software (NanoInk, Inc., USA). High-resolution magnetic probes for MFM (MESP-HR) were purchased from Veeco Probes (USA) and Pointprobe Plus Si SPM sensors (Nanosensors, Inc., USA) were used for topographical and non-contact imaging. DPN experiments: In a typical experiment, PEG (2000 g mol-1, 5mgmL-1) was dissolved in a solvent (10 mL). NM solution (50 μL of 10 mg mL-1) was added to the PEG solution and sonicated for 1 min. Twelve-pen M-type tip arrays (NanoInk, Inc., USA) were dipped in the solution and dried under a flowing N2 stream. DPN experiments were performed in an environmental chamber with active humidity control at a relative humidity of 90% at a temperature of 25-29 8°C. The patterns were generated using InkCAD software (NanoInk, Inc., USA) that could control dwell time and position of the tip arrays on the surface. PPL experiments: Polymer-pen tip arrays with 80-mm spacing between tips were prepared as previously reported[12]. In a typical experiment, PEG (2000 g mol-1, 5 mg mL-1) was dissolved in a solvent (10 μL). NM solution (50μL at 10mg mL-1) was added to the PEG solution and sonicated for 1 min. The ink solution was added to the PDMS tip arrays by spin-coating (1 mL, 2000 rpm, 3min). PPL experiments were carried out on an NScriptor workstation as described previously[12] using InkCAD software (NanoInk, Inc., USA) with feedback turned off and a relative humidity of x wafer with a 500-nm thermal oxide layer. The inner nanoelectrodes were patterned by electron-beam lithography followed by thermal evaporation and resist liftoff, resulting in electrodes with a gap of 500 nm (Figure S4). The C60-PEG composite ink was deposited by MA-DPN at a scanning rate of 0.01 μ s-1.

KW - Dip-pen nanolithography

KW - Nanomaterials poly(ethylene glycol)

KW - Polymer-pen lithography

UR - http://www.scopus.com/inward/record.url?scp=77952678624&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77952678624&partnerID=8YFLogxK

U2 - 10.1002/smll.200901198

DO - 10.1002/smll.200901198

M3 - Article

C2 - 19885890

AN - SCOPUS:77952678624

VL - 6

SP - 1077

EP - 1081

JO - Small

JF - Small

SN - 1613-6810

IS - 10

ER -