Magnetic annular nanostructure fabrication using ion beam proximity lithography

Ariel Ruiz, Vishal Parekh, James Rantschler, Paul Ruchhoeft, Sakhrat Khizroev, Dmitri Litvinov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We describe the fabrication of large-area magnetic ring structures using ion beam proximity lithography (IBPL) to pattern an array of circular openings and then use a conforming oxide coating to define the ring structure through the sidewall coating. Arrays of Permalloy rings with sub 500nm outer diameter and 150nm inner diameter on a 650nm pitch over a 5.5mm × 6mm area were fabricated to study transitions between the micromagnetic configurations within these structures. The results suggest that the field required for onion-to-vortex transition and field required for vortex-to-onion transition to be 0Oe and 400Oe, respectively.

Original languageEnglish (US)
Title of host publication2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Pages631-632
Number of pages2
DOIs
StatePublished - 2008
Externally publishedYes
Event2008 8th IEEE Conference on Nanotechnology, IEEE-NANO - Arlington, TX, United States
Duration: Aug 18 2008Aug 21 2008

Publication series

Name2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Conference

Conference2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Country/TerritoryUnited States
CityArlington, TX
Period8/18/088/21/08

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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