Low-loss channel waveguide on high-energy-beam sensitive glass

Namkhun Srisanit; Michael R. Wang

doi:10.1109/LPT.2003.809945

Low-loss channel waveguide on high-energy-beam sensitive glass

Namkhun Srisanit, Michael R. Wang

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

We report on the fabrication of optical channel waveguide on a high-energy-beam sensitive glass using a maskless non-photolithographic processing technique. Laser direct writing and one-step chemical etching result in high quality channel waveguide with a propagation loss of about -0.27 dB/cm at 1550-nm wavelength.

Original language	English (US)
Pages (from-to)	703-705
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	15
Issue number	5
DOIs	https://doi.org/10.1109/LPT.2003.809945
State	Published - May 2003

Keywords

Channel waveguide
Integrated optics
Photonic device

ASJC Scopus subject areas

Electrical and Electronic Engineering
Physics and Astronomy (miscellaneous)
Atomic and Molecular Physics, and Optics

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10.1109/LPT.2003.809945

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title = "Low-loss channel waveguide on high-energy-beam sensitive glass",

abstract = "We report on the fabrication of optical channel waveguide on a high-energy-beam sensitive glass using a maskless non-photolithographic processing technique. Laser direct writing and one-step chemical etching result in high quality channel waveguide with a propagation loss of about -0.27 dB/cm at 1550-nm wavelength.",

keywords = "Channel waveguide, Integrated optics, Photonic device",

author = "Namkhun Srisanit and Wang, {Michael R.}",

note = "Funding Information: Manuscript received October 23, 2002; revised December 19. 2002. This work was supported in part by the Missile Defense Agency under Contract F04611-00-C-0005. The authors are with the Department of Electrical and Computer Engineering, University of Miami, Coral Gables, FL 33124 USA (e-mail: mwang@ miami.edu). Digital Object Identifier 10.1109/LPT.2003.809945 Fig. 1. Fabrication processes of the channel waveguide in HEBS glass. The processes include laser direct writing and single-step chemical etching.",

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AU - Wang, Michael R.

N1 - Funding Information: Manuscript received October 23, 2002; revised December 19. 2002. This work was supported in part by the Missile Defense Agency under Contract F04611-00-C-0005. The authors are with the Department of Electrical and Computer Engineering, University of Miami, Coral Gables, FL 33124 USA (e-mail: mwang@ miami.edu). Digital Object Identifier 10.1109/LPT.2003.809945 Fig. 1. Fabrication processes of the channel waveguide in HEBS glass. The processes include laser direct writing and single-step chemical etching.

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N2 - We report on the fabrication of optical channel waveguide on a high-energy-beam sensitive glass using a maskless non-photolithographic processing technique. Laser direct writing and one-step chemical etching result in high quality channel waveguide with a propagation loss of about -0.27 dB/cm at 1550-nm wavelength.

AB - We report on the fabrication of optical channel waveguide on a high-energy-beam sensitive glass using a maskless non-photolithographic processing technique. Laser direct writing and one-step chemical etching result in high quality channel waveguide with a propagation loss of about -0.27 dB/cm at 1550-nm wavelength.

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KW - Integrated optics

KW - Photonic device

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JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

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Low-loss channel waveguide on high-energy-beam sensitive glass

Abstract

Keywords

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