Focused ion-beam fabrication of nanoscale magnetic structures

D. Litvinov, F. Chen, E. Svedberg, T. Ambrose, J. A. Bain, T. E. Schlesinger, J. K. Howard, S. Khizroev

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this article, the direct FIB etching of magnetic thin films to form nanostructures is explored. The effect of Ga+ ion implantation on magnetic properties as well as possibility of using thin capping layers to reduce Ga+ implantation are studied. The shape and size dependence of magnetic domain patterns in FIB- fabricated nanostructures are investigated.

Original languageEnglish (US)
Title of host publicationIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780376471, 9780780376472
DOIs
StatePublished - 2003
Externally publishedYes
Event2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States
Duration: Mar 30 2003Apr 3 2003

Publication series

NameIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference

Conference

Conference2003 IEEE International Magnetics Conference, Intermag 2003
Country/TerritoryUnited States
CityBoston
Period3/30/034/3/03

Keywords

  • Electron beams
  • Etching
  • Fabrication
  • Ion beams
  • Magnetic domains
  • Magnetic films
  • Magnetic materials
  • Magnetosphere
  • Nanostructures
  • Perpendicular magnetic recording

ASJC Scopus subject areas

  • Engineering(all)

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