Focused ion-beam fabrication of nanoscale magnetic structures

D. Litvinov, F. Chen, E. Svedberg, T. Ambrose, J. A. Bain, T. E. Schlesinger, J. K. Howard, S. Khizroev

Research output: Contribution to journalConference articlepeer-review

Abstract

The focused ion-beam fabrication of nanoscale magnetic structures was discussed. The effects of the Ga ion implantation on the magnetic properties as well as the possibility of using thin capping layers to reduce Ga ion implantation were also studied. Intentional Ga ion implantation into a 50nm Co thin film was performed to study this effect.

Original languageEnglish (US)
Pages (from-to)ET07
JournalDigests of the Intermag Conference
StatePublished - 2003
Externally publishedYes
EventIntermag 2003: International Magnetics Conference - Boston, MA, United States
Duration: Mar 28 2003Apr 3 2003

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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