Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays

R. P. Brekosky, C. A. Allen, Massimiliano Galeazzi, J. D. Gygax, H. Isenburg, R. L. Kelley, D. McCammon, R. A. McClanahan, F. S. Porter, C. K. Stahle, A. E. Szymkowiak

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We have developed an improved microcalorimeter array that will be used on the AstroE-2 satellite mission. The 6×6 array consists of a grid of 36 suspended pixels. Each 1.5μm thick pixel has an ion-implanted thermometer, four thermal links (support beams), and four X-ray absorber support tabs. Improvements i Silicon micro-machining capabilities and the availability of custom Silicon-on-Insulator (SOI) wafers has enabled us to precisely control pixel geometry, lead widths, and develop a more compact array. Knowing the silicon thickness, we can calculate a precise implant dose for the thermometer. Using a high-temperature anneal, we can uniformly diffuse the implant throughout the depth of the top layer of the SOI wafer. Defining the length, width, and thickness of the support beams, we can control the thermal conductance of the pixel. Advancements in polymer-photo resists have enabled us to develop a new absorber support tab attachment scheme resulting in more controlled heat dissipation from the absorber to the thermometer on the pixel. An overview of fabrication improvements focusing on these topics will be discussed.

Original languageEnglish (US)
Pages (from-to)439-442
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, A
Volume520
Issue number1-3
DOIs
StatePublished - Mar 11 2004

Fingerprint

calorimeters
Pixels
pixels
Thermometers
thermometers
Fabrication
X rays
Silicon
beams (supports)
fabrication
silicon
absorbers
x rays
insulators
wafers
Heat losses
machining
Telecommunication links
attachment
availability

Keywords

  • Array
  • Astro-E2
  • Fabrication
  • Microcalorimeter
  • Pixel
  • XRS

ASJC Scopus subject areas

  • Instrumentation
  • Nuclear and High Energy Physics

Cite this

Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays. / Brekosky, R. P.; Allen, C. A.; Galeazzi, Massimiliano; Gygax, J. D.; Isenburg, H.; Kelley, R. L.; McCammon, D.; McClanahan, R. A.; Porter, F. S.; Stahle, C. K.; Szymkowiak, A. E.

In: Nuclear Inst. and Methods in Physics Research, A, Vol. 520, No. 1-3, 11.03.2004, p. 439-442.

Research output: Contribution to journalArticle

Brekosky, RP, Allen, CA, Galeazzi, M, Gygax, JD, Isenburg, H, Kelley, RL, McCammon, D, McClanahan, RA, Porter, FS, Stahle, CK & Szymkowiak, AE 2004, 'Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays', Nuclear Inst. and Methods in Physics Research, A, vol. 520, no. 1-3, pp. 439-442. https://doi.org/10.1016/j.nima.2003.11.358
Brekosky, R. P. ; Allen, C. A. ; Galeazzi, Massimiliano ; Gygax, J. D. ; Isenburg, H. ; Kelley, R. L. ; McCammon, D. ; McClanahan, R. A. ; Porter, F. S. ; Stahle, C. K. ; Szymkowiak, A. E. / Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays. In: Nuclear Inst. and Methods in Physics Research, A. 2004 ; Vol. 520, No. 1-3. pp. 439-442.
@article{de8982b46338426293eeb7bca3449ab3,
title = "Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays",
abstract = "We have developed an improved microcalorimeter array that will be used on the AstroE-2 satellite mission. The 6×6 array consists of a grid of 36 suspended pixels. Each 1.5μm thick pixel has an ion-implanted thermometer, four thermal links (support beams), and four X-ray absorber support tabs. Improvements i Silicon micro-machining capabilities and the availability of custom Silicon-on-Insulator (SOI) wafers has enabled us to precisely control pixel geometry, lead widths, and develop a more compact array. Knowing the silicon thickness, we can calculate a precise implant dose for the thermometer. Using a high-temperature anneal, we can uniformly diffuse the implant throughout the depth of the top layer of the SOI wafer. Defining the length, width, and thickness of the support beams, we can control the thermal conductance of the pixel. Advancements in polymer-photo resists have enabled us to develop a new absorber support tab attachment scheme resulting in more controlled heat dissipation from the absorber to the thermometer on the pixel. An overview of fabrication improvements focusing on these topics will be discussed.",
keywords = "Array, Astro-E2, Fabrication, Microcalorimeter, Pixel, XRS",
author = "Brekosky, {R. P.} and Allen, {C. A.} and Massimiliano Galeazzi and Gygax, {J. D.} and H. Isenburg and Kelley, {R. L.} and D. McCammon and McClanahan, {R. A.} and Porter, {F. S.} and Stahle, {C. K.} and Szymkowiak, {A. E.}",
year = "2004",
month = "3",
day = "11",
doi = "10.1016/j.nima.2003.11.358",
language = "English (US)",
volume = "520",
pages = "439--442",
journal = "Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment",
issn = "0168-9002",
publisher = "Elsevier",
number = "1-3",

}

TY - JOUR

T1 - Fabrication process responsible for fundamentally improving Silicon X-ray microcalorimeter arrays

AU - Brekosky, R. P.

AU - Allen, C. A.

AU - Galeazzi, Massimiliano

AU - Gygax, J. D.

AU - Isenburg, H.

AU - Kelley, R. L.

AU - McCammon, D.

AU - McClanahan, R. A.

AU - Porter, F. S.

AU - Stahle, C. K.

AU - Szymkowiak, A. E.

PY - 2004/3/11

Y1 - 2004/3/11

N2 - We have developed an improved microcalorimeter array that will be used on the AstroE-2 satellite mission. The 6×6 array consists of a grid of 36 suspended pixels. Each 1.5μm thick pixel has an ion-implanted thermometer, four thermal links (support beams), and four X-ray absorber support tabs. Improvements i Silicon micro-machining capabilities and the availability of custom Silicon-on-Insulator (SOI) wafers has enabled us to precisely control pixel geometry, lead widths, and develop a more compact array. Knowing the silicon thickness, we can calculate a precise implant dose for the thermometer. Using a high-temperature anneal, we can uniformly diffuse the implant throughout the depth of the top layer of the SOI wafer. Defining the length, width, and thickness of the support beams, we can control the thermal conductance of the pixel. Advancements in polymer-photo resists have enabled us to develop a new absorber support tab attachment scheme resulting in more controlled heat dissipation from the absorber to the thermometer on the pixel. An overview of fabrication improvements focusing on these topics will be discussed.

AB - We have developed an improved microcalorimeter array that will be used on the AstroE-2 satellite mission. The 6×6 array consists of a grid of 36 suspended pixels. Each 1.5μm thick pixel has an ion-implanted thermometer, four thermal links (support beams), and four X-ray absorber support tabs. Improvements i Silicon micro-machining capabilities and the availability of custom Silicon-on-Insulator (SOI) wafers has enabled us to precisely control pixel geometry, lead widths, and develop a more compact array. Knowing the silicon thickness, we can calculate a precise implant dose for the thermometer. Using a high-temperature anneal, we can uniformly diffuse the implant throughout the depth of the top layer of the SOI wafer. Defining the length, width, and thickness of the support beams, we can control the thermal conductance of the pixel. Advancements in polymer-photo resists have enabled us to develop a new absorber support tab attachment scheme resulting in more controlled heat dissipation from the absorber to the thermometer on the pixel. An overview of fabrication improvements focusing on these topics will be discussed.

KW - Array

KW - Astro-E2

KW - Fabrication

KW - Microcalorimeter

KW - Pixel

KW - XRS

UR - http://www.scopus.com/inward/record.url?scp=12144286778&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=12144286778&partnerID=8YFLogxK

U2 - 10.1016/j.nima.2003.11.358

DO - 10.1016/j.nima.2003.11.358

M3 - Article

AN - SCOPUS:12144286778

VL - 520

SP - 439

EP - 442

JO - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

JF - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

SN - 0168-9002

IS - 1-3

ER -