Fabrication of patterned recording medium using ion beam proximity lithography

Vishal Parekh, Ariel Ruiz, E. Chunsheng, James Rantschler, Paul Ruchhoeft, Sakhrat Khizroev, Dmitri Litvinov, D. Weller

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We describe the lithographic structuring of large-area patterned medium samples with sub-50nm features using ion beam proximity lithography (IBPL). The quality of the patterns formed in IBPL system is primarily limited by the quality of the stencil masks. Hence, the emphasis of this work has been to develop a reliable mask fabrication process that can achieve a size uniformity that is suitable for patterned media. We have developed a mask fabrication approach that incorporates palladium as a hard mask for transferring the lithography pattern through a silicon nitride membrane. A conformal gold coating allows for further reduction of the mask features without a significant increase in the feature size variation. An average standard deviation of 3nm and 5nm was measured during various steps of the stencil mask fabrication and after printing using IBPL in PMMA resist, respectively. Patterned medium prototypes with features ranging from 40nm to 300nm have been fabricated and magnetic properties measured. A 6-12 fold increase in coercivity was measured for multilayer samples after patterning. Ion irradiation of patterned multilayer samples was also studied as a means to control magnetic anisotropy as well as to evaluate possible ion irradiation damage involved in ion-beam proximity lithography patterning. Patterned multilayer samples show a decrease in coercivity from 11kOe for as-patterned to 0.3kOe for 800μC/cm2 and suggests that ion irradiation can be an integral part of bit patterned medium fabrication for anisotropy control.

Original languageEnglish (US)
Title of host publication2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings
Pages632-636
Number of pages5
DOIs
StatePublished - 2007
Externally publishedYes
Event2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 - Hong Kong, China
Duration: Aug 2 2007Aug 5 2007

Publication series

Name2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings

Other

Other2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007
Country/TerritoryChina
CityHong Kong
Period8/2/078/5/07

Keywords

  • Ion-beam proximity lithography
  • Nanostructured arrays
  • Patterned medium
  • Stencil mask fabrication

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

Fingerprint

Dive into the research topics of 'Fabrication of patterned recording medium using ion beam proximity lithography'. Together they form a unique fingerprint.

Cite this