Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

Ana Maria Popa, Philippe Niedermann, Harry Heinzelmann, Jeffrey A. Hubbell, Raphal Pugin

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80nm mean pore diameter.

Original languageEnglish
Article number485303
JournalNanotechnology
Volume20
Issue number48
DOIs
StatePublished - Nov 25 2009
Externally publishedYes

Fingerprint

Nanopores
Silicon nitride
Lithography
Block copolymers
Membranes
Fabrication
Silicon oxides
Reactive ion etching
Micelles
Silicon
Aspect ratio
Masks
Monolayers
Metals
Substrates
silicon nitride

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)

Cite this

Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography. / Popa, Ana Maria; Niedermann, Philippe; Heinzelmann, Harry; Hubbell, Jeffrey A.; Pugin, Raphal.

In: Nanotechnology, Vol. 20, No. 48, 485303, 25.11.2009.

Research output: Contribution to journalArticle

Popa, Ana Maria ; Niedermann, Philippe ; Heinzelmann, Harry ; Hubbell, Jeffrey A. ; Pugin, Raphal. / Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography. In: Nanotechnology. 2009 ; Vol. 20, No. 48.
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