Extended skyrmion phase in epitaxial FeGe(111) thin films

S. X. Huang; C. L. Chien

doi:10.1103/PhysRevLett.108.267201

Extended skyrmion phase in epitaxial FeGe(111) thin films

S. X. Huang, C. L. Chien

Research output: Contribution to journal › Article › peer-review

312 Scopus citations

Abstract

The Skyrmion state in epitaxial B20 FeGe(111) thin films, determined by the topological Hall effect, is greatly extended in the phase diagram to cover all temperatures up to the Curie temperature T _C271K and over a wide magnetic field range that includes a zero magnetic field. The properties of the Skyrmion phase can be controlled and manipulated by the film thickness, which has a strong effect on the stabilization of Skyrmions.

Original language	English (US)
Article number	267201
Journal	Physical Review Letters
Volume	108
Issue number	26
DOIs	https://doi.org/10.1103/PhysRevLett.108.267201
State	Published - Jun 26 2012
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1103/PhysRevLett.108.267201

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title = "Extended skyrmion phase in epitaxial FeGe(111) thin films",

abstract = "The Skyrmion state in epitaxial B20 FeGe(111) thin films, determined by the topological Hall effect, is greatly extended in the phase diagram to cover all temperatures up to the Curie temperature T C271K and over a wide magnetic field range that includes a zero magnetic field. The properties of the Skyrmion phase can be controlled and manipulated by the film thickness, which has a strong effect on the stabilization of Skyrmions.",

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AB - The Skyrmion state in epitaxial B20 FeGe(111) thin films, determined by the topological Hall effect, is greatly extended in the phase diagram to cover all temperatures up to the Curie temperature T C271K and over a wide magnetic field range that includes a zero magnetic field. The properties of the Skyrmion phase can be controlled and manipulated by the film thickness, which has a strong effect on the stabilization of Skyrmions.

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Extended skyrmion phase in epitaxial FeGe(111) thin films

Abstract

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