Effect of post-deposition processing on ZnO thin films and devices

Tingfang Yen, Alan Haungs, Sung Jin Kim, Alexander Cartwright, Wayne A. Anderson

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


Post-deposition processing was conducted on ZnO thin films deposited by radio frequency (RF) magnetron sputtering. Rapid thermal annealing (RTA) and ion implantation followed by RTA gave increased conductivity and the latter increased Hall-effect mobility from 1.7 cm 2 V -1 s -1 to 9.5 cm 2 V -1 s -1 Metal-semiconductor-metal photodetectors (MSM-PDs) had a low dark current, a high ratio of photo to dark current, and a high responsivity of 2.1 A/W. Current transport mechanisms of MSM-PDs with post-annealing exhibited two primary space-charge-limited mechanisms, m > 2 and m < 1, following I ≈ V m. The non-annealed ZnO film gave one mechanism with m < 1 in photo I-V. Response to a femtosecond pulse gave rise and fall times in the range of 12 ns to 29 ns.

Original languageEnglish (US)
Pages (from-to)568-572
Number of pages5
JournalJournal of Electronic Materials
Issue number5
StatePublished - May 2010
Externally publishedYes


  • Annealing
  • Detector
  • Nitrogen
  • Sputtering
  • Thin film
  • ZnO

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry


Dive into the research topics of 'Effect of post-deposition processing on ZnO thin films and devices'. Together they form a unique fingerprint.

Cite this