Optical waveguides have proven to be an excellent transmission medium in the near infrared frequency region. The current emphasis in fiber fabrication technology has shifted toward achieving a higher production rate for these preforms. A number of different processing techniques such as outside Vapor Phase Oxidation (OVPO), Vapor Axial Deposition (VAD), Vapor Radial Deposition, Modified Chemical Vapor Deposition (MCVD), and Plasma Chemical Vapor Deposition (PCVD) have demonstrated potential in manufacture of these waveguides (Sarkar, 1985). Of the above, the MCVD process is widely used because of its ease of implementation. Although qualitative descriptions of the MCVD process have been reported very little theoretical and experimental work has been done to unravel the important phenomena of the process. This paper describes a bench scale set up to study the important processes involved in the manufacture of optical waveguide patterns.
|Original language||English (US)|
|Number of pages||4|
|State||Published - 1986|
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