CoCrPtTa/Ti perpendicular media deposited at high sputtering rate

Bin Lu, Timothy Klemmer, Sakhrat Khizroev, J. Kent Howard, Dmitri Litvinov, Anup G. Roy, David E. Laughlin

Research output: Contribution to journalConference articlepeer-review

9 Scopus citations

Abstract

CoCrPtTa/Ti bilayer thin films have been sputter deposited onto both glass and Al substrates under high sputtering rate in a manufacturing environment. From microstructure and magnetic property studies, it is found that Cr segregation and stacking fault density are the two major issues in obtaining high quality perpendicular media. (0002) texture orientation spread and c lattice parameter remain almost constant within the variation range of the deposition parameters, though there is a small distinction between the media on glass and those on Al substrates.

Original languageEnglish (US)
Pages (from-to)1319-1322
Number of pages4
JournalIEEE Transactions on Magnetics
Volume37
Issue number4 I
DOIs
StatePublished - Jul 2001
Externally publishedYes
Event8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States
Duration: Jan 7 2001Jan 11 2001

Keywords

  • Co-alloy
  • Magnetic properties
  • Microstructure
  • Perpendicular media
  • Sputtering rate

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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